Nano logos: the art (and science) of writing tiny with electron-beam lithography

NFK summer student Sarah Choudhury developed an EBL process this summer that enables patterning of metal in the nanometre scale. In this example, the entire NFK logo (chromium on silicon) is 25 micrometres wide. The smallest features observed were just 18 nm across! The Physics Dept. published a story with more images here.