Documents describing processes that can be done at NFK were developed with the help of CMC Microsystems and are available on the CMC website via the links below. These documents are free of charge and can be accessed using your CMC Microsystems user account information (the same information used to access NFK’s Booking Calendar).
User Guides give details of experimental results of a particular tool or process, typically meant to show trends or ranges of useful values for various process parameters.
Metal liftoff using AZ nLOF 2020 with maskless photolithography
Description of the liftoff process for patterned metallization of silicon substrates using a negative tone photoresist.
KJ Lesker PVD 75 Physical Vapour Deposition (Sputter) System
Sputtering information for targets available at NanoFabrication Kingston, as determined using a KJ Lesker PVD 75 Physical Vapour Deposition System.
Characterization of the Plasma Preen System
Description of etching rates of an oxygen plasma treatment of some common resists under various plasma power conditions using a Plasma-Preen II plasma cleaner.
Process Recipes are step-by-step instructions for performing a given process, which includes semi-optimized processing parameters for a particular tool or toolset.
Recipes coming soon...
For a complete listing of all NFK documents (User Guides, Process Recipes, Standard Operating Procedures, and Procedural Documents), check out the full library on CMC’s website.